EUV 技术的可扩展性具有持续的成本效益，有望使客户进一步从多重曝光转向使用低数值孔径（0.33 NA）EUV和高数值孔径（0.55 NA ...

一场价值不菲的科技豪赌。 据报道，美国政府投资价值约10 亿美元的研究中心，以开发下一代极紫外光（EUV）制程技术，挑战荷兰产业领导者艾司 ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the most expensive semiconductor manufacturing tools in history.