从早期的深紫外（DUV）光刻机起步，其稳定可靠的性能为半导体产业的发展奠定了坚实基础；到后来的极紫外（EUV）光刻机以其独特的极紫外光源和 ...

一场价值不菲的科技豪赌。 据报道，美国政府投资价值约10 亿美元的研究中心，以开发下一代极紫外光（EUV）制程技术，挑战荷兰产业领导者艾司 ...

EUV 技术的可扩展性具有持续的成本效益，有望使客户进一步从多重曝光转向使用低数值孔径（0.33 NA）EUV和高数值孔径（0.55 NA ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

There is a new type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below. Professor Tsumoru Shintake ...

Indium materials are to be designed and tested in a project to enable the build of next generation of computer chips.

Andrew Grenville, chief executive of resist maker Inpria, sat down with Semiconductor Engineering to talk about photoresists for extreme ultraviolet (EUV) lithography. What follows are excerpts of ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

Taiwan Semiconductor’s EUV system share grew to 56% globally by 2023, expanding its advanced chip production capacity. Taiwan Semiconductor acquired over 100 EUV machines in 2023, bolstering its ...