Amid the ramp of extreme ultraviolet (EUV) lithography in the market, suppliers of EUV mask blanks are expanding their production. And a new player—Applied Materials—is looking to enter the market.
As feature sizes shrink and device densities increase, ensuring that masks remain defect-free becomes critical.
DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that ...
Previous photolithography technologies used transmissive masks protected by a pellicle. For EUV lithography, however, the masks must be reflective and cannot have a protective pellicle as this ...
This also minimizes mask 3D effects. “It’s like the egg of Columbus,” explains Prof. Shintake, “in that it may seem impossible at first glance, but once solved, it becomes very simple.” The global EUV ...
Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to ... the production and inspection of the masks defining the features to be etched, and the output power of the light source.
a leader in computational lithography and metrology that has been working on e-beam inspection systems specially designed for mask manufacturers to identify pattern defects for EUV masks.
With the introduction of Extreme Ultra Violet lithography, the need for EUV test facilities ... EBL2 also has an XPS system that can analyse EUV masks and pellicles, including a functionality for the ...
Drew Chambers, Global Business Director and Anthony Kluth, Integrated Operations Leader, both at Lithography Technologies, ...
The fiscal second quarter saw robust growth in IT revenue and margins on EUV mask blank and HDD substrate demand, while Life Care profits declined due to increased promotional spending.