DNP Achieves Fine Pattern Resolution on EUV Lithography Photomasks for Beyond 2nm Generation
DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that ...
ASML 推出 High NA EUV 光刻机 TWINSCAN EXE:5000 乐高套装
TWINSCAN EXE:5000 光刻机是首款采用 0.55NA 数值孔径的光刻机，其分辨率达 8nm，成像对比度较此前的 NXE 系列 0.33NA EUV 系统高 40%，支持 2nm 逻辑节点图案化，单价达 3.5 ...
TechSpot27 天
TSMC prepares for next-gen chip manufacturing with high-NA EUV investments
Why it matters: TSMC's investments in EUV and high-NA EUV technologies are poised to shape the future of semiconductor manufacturing. These hefty investments will enable the production of ...
来自MSN11 天
851个零件复刻全球最贵光刻机！ASML推出High NA EUV乐高套装
光刻设备制造商ASML近日在其官网纪念品商城推出了一款特别的产品——High NA EUV光刻系统TWINSCAN EXE:5000的乐高模型套装。 这款乐高模型由ASML的员工兼乐高爱好者Rick ...
来自MSN19 天
受AI芯片需求刺激 台积电加速High-NA EUV部署
今年9月，台积电（TSMC）从ASML手上接收了其首台High-NA ...
Semiconductor Engineering10 天
Takeaways From The 2024 SPIE Photomask Technology + EUV Conference
As feature sizes shrink and device densities increase, ensuring that masks remain defect-free becomes critical.
ASML推出乐高版High NA EUV光刻机，851个零件还原，售价1653元
光刻机巨头ASML近期在其官方纪念品商店推出了一项令人瞩目的新品——TWINSCAN EXE:5000 High NA EUV光刻机的乐高模型套装。这一创意产品不仅吸引了科技爱好者的目光，也激发了乐高积木爱好者的浓厚兴趣。
台积电加速布局High-NA EUV技术，以满足AI芯片激增的需求
在人工智能快速升级的浪潮中，台积电（TSMC）正在加快其High-NA极紫外光刻（EUV）技术的部署，以满足不断增长的AI芯片需求。今年9月，台积电从ASML手中接收了其首台High-NA EUV光刻机，将其带回自家全球研发中心进行深入研究。这一举动不仅体现了台积电在先进制程技术上的追求，也揭示了其未来发展战略的潜在方向。 据业界消息，台积电董事长兼首席执行官魏哲家在与ASML的谈判中，运用了精准 ...