Discover Key Insights with the “Extreme Ultraviolet (EUV) Photoresist Market Size Outlook 2024-2032” Report What critical trends are shaping the future of the Extreme Ultraviolet (EUV) Photoresist ...
For the first time, researchers have used high-speed laser writing to create lines spaced just 100 nm apart on a glass ...
Researchers developed a new optimized printing approach that could enable super-resolution 3D direct laser writing (DLW) of microlenses, photonics crystals, micro-optical devices, metamaterials and ...
At the core of every smartphone, computer, and digital gadget lies a technological marvel that has transformed the 20th and ...
Breaking Taps on MSN4 天
DIY Semiconductor Patterning
This is a maskless technique (similar to projection lithography) to create patterns in a photosensitive resin (photoresist).
Resonac Holdings Corp. is studying deal structures for a possible acquisition of government-owned chip linchpin JSR Corp., a ...
"However, by using a unique dual-beam optical setup and a special photoresist, we were able to overcome this challenge and achieve super-resolution DLW." In the journal Optics Letters, the ...
Japan's Resonac Holdings is looking to make deals after reducing its borrowing and wants to be involved when a state-backed ...
For the first time, researchers have used high-speed laser writing to create lines spaced just 100 nm apart on a glass substrate. The ...
Bettadapur to drive the commercialization and market adoption of company’s innovative EUV photoresist platform.