For the first time, researchers have used high-speed laser writing to create lines spaced just 100 nm apart on a glass ...

DuPont de Nemours Inc. DD recently announced the completion of a considerable expansion of photoresist manufacturing capacity at its Sasakami Site in Agano-shi, Niigata, Japan. The event was ...

FREMONT, Calif., Jan. 29, 2025 /PRNewswire/ -- Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been selected by a leading ...

Researchers developed a new optimized printing approach that could enable super-resolution 3D direct laser writing (DLW) of microlenses, photonics crystals, micro-optical devices, metamaterials and ...

For the first time, researchers have used high-speed laser writing to create lines spaced just 100 nm apart on a glass substrate. The ...

Texas Governor Greg Abbott has announced a $2.4 million grant for a new specialty chemical and semiconductor facility in Killeen. The project planned by Dongjin ...

The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...

The key to these processes is lithography. Optical lithography is a photographic procedure in which a light-sensitive polymer ...

Integrated circuits are patterned by exposing light-sensitive photoresist materials deposited on silicon wafers and then removing the exposed (or sometimes unexposed) areas using low-pressure ...

Bettadapur to drive the commercialization and market adoption of company’s innovative EUV photoresist platform.