·聚焦:人工智能、芯片等行业欢迎各位客官关注、转发前言:各大巨头在未来仍将围绕High-NA ...
Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for ...
Why it matters: TSMC's investments in EUV and high-NA EUV technologies are poised to shape the future of semiconductor manufacturing. These hefty investments will enable the production of ...
analysis Over the last couple of weeks, TSMC's ambitious roadmap for its 2nm manufacturing process has sparked significant ...
ASML has pulled back 40% from its highs. But management just reiterated its positive outlook for 2030. EUV technology ...
High NA EUV光刻机是全球首款采用0.55NA数值孔径的光刻机,分辨率达到8nm,成像对比度比之前的NXE系列0.33NA EUV系统高出40%,支持2nm逻辑节点图案化,单价高达3.5亿欧元。 Rick Lenssen此前曾花费2.5年时间 ...
IT之家 12 月 2 日消息,ASML 在官网纪念品商城上架了一款特殊的产品:世界首型 High NA EUV 光刻系统 TWINSCAN EXE:5000 的乐高模型套装。TWINSCAN EXE:5000 光刻机是首款采用 0.55NA ...
ASML Holding has bolstered confidence with its recent long-term outlook update. Click here to find out why I maintain a ...
光刻机巨头ASML近期在其官方纪念品商店推出了一项令人瞩目的新品——TWINSCAN EXE:5000 High NA EUV光刻机的乐高模型套装。这一创意产品不仅吸引了科技爱好者的目光,也激发了乐高积木爱好者的浓厚兴趣。
今年9月,台积电(TSMC)从ASML手上接收了其首台High-NA ...
As feature sizes shrink and device densities increase, ensuring that masks remain defect-free becomes critical.