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宽禁带科技论|镓仁半导体:在β-氧化镓单晶生长领域取得关键技术突破
近日,杭州镓仁半导体联合浙江大学研究团队,在β-氧化镓(β-Ga2O3)单晶生长领域取得关键技术突破!在国际知名期刊Crystal Growth & Design第25卷/第3期发表了题为《 Highly Coherent Grain Boundaries Induced by Local Pseudomirror Symmetry in β-Ga2O3 》的研究论文。
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