Samsung Electronics has reportedly reduced its use of thick photoresist (PR) in the photolithography process for its latest ...

Digital photo and scanning electron microscope of a transparent hybrid photoresist film of titanium dioxide nanoparticle-embedded acrylic resin with thickness of 29 μm Credit must be given to the ...

Although the US and Dutch governments have banned ASML from selling extreme ultraviolet (EUV) and advanced deep ultraviolet ...

A technical paper titled “Vapor-Phase Infiltrated Organic–Inorganic Positive-Tone Hybrid Photoresist for Extreme UV Lithography” was published by researchers at Stony Brook University, Brookhaven ...

To speed up the TPL process, highly sensitive photoresists are essential. To date, the classic SU-8 epoxy photoresist series ...

The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...