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盛美上海前段半导体制造清洗设备Ultra C Tahoe取得重要性能突破
e公司讯,盛美半导体设备 (上海)股份有限公司 (简称“盛美上海”)今天宣布旗下清洗设备产品Ultra C Tahoe取得重要性能突破。此次提升能够满足更先进的晶圆代工、逻辑器件及存储器件的严格技术要求。据盛美上海估算,仅硫酸一项每年就可节省高达50万美元的成本,且在硫酸废液处理上可进一步降低成本并对环境更友好。中国大陆多家大型晶圆厂客户已将升级后的Ultra C ...
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